This session presents assessments and new analysis techniques for yield, reliability and mask optimisations for advanced technology nodes. The first paper uses a GAN neural network to accelerate mask optimization. The second paper presents a Bayesian model for dimensionality reduction for fast estimation of SRAM failure regions. The third paper proposes compact models for interconnect aging including electromigration, thermomigration and stress migration. The last paper presents a sampling methodology for searching failure regions with reduced sample size and better efficiency and accuracy.